Titania-assisted electron-beam and synchrotron lithography

15 Aug 2010
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Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon the generation of Pd nanoparticles in Pd2+-loaded TiO2 films is being developed by scientists in Belarus, Switzerland and Germany. The team's approach permits switching from negative to positive imaging during pattern generation, which could open up fresh opportunities for the formation of schemotechnical elements of complex structures.


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